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New Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching

Kwon, G.-C.; Kim, H.-S.; Kim, J.-S.; Choi, S.-H.; Jun, J.-H.; Lee, D.S.; Lee, Y.K.; et al, 2003 IEEE International Conference on Plasma Science, pp.403 -, IEEE, 2003-06-02

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