Recent Developments in Processing Techniques of Dense Silicon Nitride
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | H. Kim | ko |
| dc.contributor.author | C.H. Kim | ko |
| dc.date.accessioned | 2013-02-25T11:49:16Z | - |
| dc.date.available | 2013-02-25T11:49:16Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1983 | - |
| dc.identifier.citation | 한국세라믹학회지, v.20, no.4, pp.366 - 372 | - |
| dc.identifier.issn | 1229-7801 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/61986 | - |
| dc.language | Korean | - |
| dc.publisher | 한국세라믹학회 | - |
| dc.title | Recent Developments in Processing Techniques of Dense Silicon Nitride | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 20 | - |
| dc.citation.issue | 4 | - |
| dc.citation.beginningpage | 366 | - |
| dc.citation.endingpage | 372 | - |
| dc.citation.publicationname | 한국세라믹학회지 | - |
| dc.contributor.nonIdAuthor | H. Kim | - |
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