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1
193-nm photoresists based on norbornene copolymers with derivatives of bile acid

Kim, Jin-Baek; Lee, BW; Yun, HJ; Kwon, YG, CHEMISTRY LETTERS, v.149, pp.414 - 415, 2000-04

2
Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists

Kim, Jin-Baek; Ko, JS; Jang, JH; Choi, JH; Lee, BW, POLYMER JOURNAL, v.36, no.1, pp.18 - 22, 2004

3
Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists

Kim, Jin-Baek; Yun, HJ; Kwon, YG; Lee, BW, POLYMER, v.41, no.22, pp.8035 - 8039, 2000-10

4
Poly(t-butyl-3 alpha-(5-norbomene-2-carbonyloxy)-7 alpha,12 alpha-dihydroxy-5 beta-cholan-24-oate-co-maleic anhydride) for a 193-nm photoresist

Kim, Jin-Baek; Lee, BW; Kang, JS; Seo, DC; Roh, CH, POLYMER, v.40, no.26, pp.7423 - 7426, 1999-12

5
Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)]

Kim, Jin-Baek; Ko, JS; Choi, JH; Jang, JH; Oh, TH; Kim, HW; Lee, BW, POLYMER, v.45, no.16, pp.5397 - 5401, 2004-07

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