| 1 | Acid diffusion control in chemically amplified resists Kim, Jin-Baek; Choi, JH; Kwon, YG; Jung, MH; Chang, KH, POLYMER, v.40, no.4, pp.1087 - 1089, 1999-02 |
| 2 | Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists Kim, Jin-Baek; Ko, JS; Jang, JH; Choi, JH; Lee, BW, POLYMER JOURNAL, v.36, no.1, pp.18 - 22, 2004 |
| 3 | Control of photogenerated acid diffusion and evaporation by copolymerization with a basic monomer Kim, Jin-Baek; Kwon, YG; Choi, JH; Jung, MH, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.17, no.5, pp.2097 - 2102, 1999 |
| 4 | Effect of the ionic conductivity of a polymer matrix on the electrooptical properties of polymer-dispersed liquid crystal films Kim, Jin-Baek; Lee, MG; Choi, JH, POLYMER BULLETIN, v.41, no.1, pp.37 - 43, 1998-07 |
| 5 | Environmentally friendly negative resists based on acid-catalyzed acetalization for 193-nm lithography Kim, Jin-Baek; Jang, JH; Ko, JS; Choi, JH; Lee, KK, MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882, 2003-10 |
| 6 | Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an environmentally stable chemically amplified resist Kim, Jin-Baek; Choi, JH; Kim, H; Kwon, YG; Jung, MH, POLYMER JOURNAL, v.31, no.9, pp.695 - 699, 1999 |
| 7 | Polymer-dispersed liquid crystal films using poly(2-methyloxycarbonyl-bicyclo[2.2.1]hepta-2,5-diene-co-poly(ethylene glycol) methacrylate) as a matrix resin Kim, Jin-Baek; Lee, MG; Choi, JH, POLYMER BULLETIN, v.41, no.6, pp.701 - 705, 1998-12 |
| 8 | Regular arrays of monodisperse platinum/erbium disilicide core-shell nanowires and nanoparticles on Si(001) via a self-assembled template You, JP; Choi, JH; Kim, Sehun; Li, XM; Williams, RS; Ragan, R, NANO LETTERS, v.6, no.9, pp.1858 - 1862, 2006-09 |
| 9 | Simple micropatterning of biomolecules on a diazoketo-functionalized photoresist Ganesan, R; Yoo, SY; Choi, JH; Lee, SangYup; Kim, Jin-Baek, JOURNAL OF MATERIALS CHEMISTRY, v.18, no.6, pp.703 - 709, 2008-01 |
| 10 | Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)] Kim, Jin-Baek; Ko, JS; Choi, JH; Jang, JH; Oh, TH; Kim, HW; Lee, BW, POLYMER, v.45, no.16, pp.5397 - 5401, 2004-07 |
| 11 | Synthesis of poly(2-trimethylsilyl-2-propyl methacrylate) and their application as a dry-developable chemically amplified photoresist Kim, Jin-Baek; Kim, H; Choi, JH, POLYMER, v.40, no.6, pp.1617 - 1621, 1999-03 |
| 12 | Temperature dependent structural changes of graphene layers on 6H-SiC(0001) surfaces Kim, Ki-jeong; Lee, H; Choi, JH; Lee, HK; Kang, TH; Kim, B; Kim, Sehun, JOURNAL OF PHYSICS-CONDENSED MATTER, v.20, no.22, 2008-06 |
