Results 1-10 of 151 (Search time: 0.009 seconds).
NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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T-top Free Chemically Amplified Resists Containing Vinyllactam Derivatives Jung, Min Ho; Kim, Jin-Baek, 한국고분자학회 1997년도 춘계 학술대회, pp.108 - 109, 한국고분자학회, 1997-04 | |
Silicon Containing Bilayer Resist Lee, Jini; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회, pp.162 - 162, 한국고분자학회, 2001-10 | |
The effect of ionic conductivity and the performance of PDLC films Kim, Jin-Baek; Lee, Myung Gu; Park, Jong Jin; Lee, CS, Pacific Polymer Conference, pp.333 - 333, 1997 | |
Effect of acid structure on deprotection of poly(2-trimethylsilyl-2-propyl methacrylate) Kim, Hyun-Woo; Kim, Jin-Baek, 한국고분자학회 1998년도 추계 학술대회 , pp.80 - 81, 한국고분자학회, 1998-10-16 | |
Synthesis and Lithographic Characterization of Poly(N-p(tert-butoxycarbonyloxy)phenyl dimethacrylamide Kim, Jin-Baek, 한국고분자학회 1997년도 춘계 학술대회 , pp.100 - 101, 한국고분자학회, 1997-04 | |
Synthesis of photoresist containing acetal protected B-keto acid group Kim, Jin-Baek; Kim, Kyung Sun, 한국고분자학회 2002년 추계학술대회 , v.27, no.2, pp.255 - 255, 한국고분자학회, 2002-10 | |
Synthesis and Lithographic Characterization of Poly(hydroxystyrene-co-tert-butyl acrylate-co-3-(t-butoxycarbonyl)-1-vinylcaprolactam Kim, Jin-Baek; Jung, Min Ho; Jung, Jong Ho, 한국고분자학회 1996년도추계 학술대회 , v.21, no.2, pp.714 - 715, 한국고분자학회, 1996-10 | |
Photoresist Technology Kim, Jin-Baek, Advanced and Future Microelectronics Workshop, v.0, no.0, ETRI, 1989 | |
Lithographic Performance of a Dry-developable Photoresist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kim, Hyun-Woo, 한국고분자학회 1999년 춘계 학술대회 , pp.66 - 66, 한국고분자학회, 1999 | |
Chemically Amplified Resists based on Poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate) Kim, Jin-Baek; Park, Jong Jin, 한국고분자학회 1999년도 춘계 학술대회 연구논문초록집, pp.135 - 135, 한국고분자학회, 1999 |
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