Synthesis of photoresist containing acetal protected B-keto acid group

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Publisher
한국고분자학회
Issue Date
2002-10
Language
ENG
Citation

한국고분자학회 2002년 추계학술대회 , v.27, no.2, pp.255 - 255

URI
http://hdl.handle.net/10203/130717
Appears in Collection
CH-Conference Papers(학술회의논문)
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