1 | Lithographic Performance of a Dry-developable Photoresist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kim, Hyun-Woo, 한국고분자학회 1999년 춘계 학술대회 , pp.66 - 66, 한국고분자학회, 1999 |
2 | Chemically Amplified Resists based on Poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate) Kim, Jin-Baek; Park, Jong Jin, 한국고분자학회 1999년도 춘계 학술대회 연구논문초록집, pp.135 - 135, 한국고분자학회, 1999 |
3 | Preparation of New Polyimide-Silica Hybrid Composite via Sol-Gel Process Kim, Jin-Baek; Yoon, Kyung Hwan, 한국고분자학회 1999년 춘계 학술대회 , pp.224 - 224, 한국고분자학회, 1999 |
4 | Diffusion and surface evaporation of photogenerated acid in basic polymers for PED Stability of ArF chemically amplified resists Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.250 - 251, 한국고분자학회, 1999-10 |
5 | Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives Kim, Jin-Baek; Lee, Bum-Wook; Kang, Jae-Sung, SPIE-The International Society for Optical Engineering, pp.36 - 43, SPIE, 1999-01 |
6 | Chemically Amplified Resist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kim, Hyun-Woo, SPIE-The International Society for Optical Engineering, pp.420 - 428, Proceedings of SPIE, 1999-01 |
7 | Dry-Developable Resist Based on Methacrylate Polymer with 2-Trimethylsilyl-2-Propyl Ester Group Kim, Jin-Baek; Kim, Hyun-Woo, Asian Photochemistry Conference, 1999 |
8 | Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235, 한국고분자학회, 1999-10 |
9 | Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives Kim, Jin-Baek; Lee, Bum Wook, 한국고분자학회 1999년 춘계 학술대회, pp.66 - 66, 한국고분자학회, 1999 |
10 | Chemically Amplified Resist based on the Norbornene Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kang, Jae-Sung, 한국고분자학회 1999년 춘계 학술대회 , pp.209 - 209, 한국고분자학회, 1999 |