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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Effect of acid structure on deprotection of poly(2-trimethylsilyl-2-propyl methacrylate) Kim, Hyun-Woo; Kim, Jin-Baek, 한국고분자학회 1998년도 추계 학술대회 , pp.80 - 81, 한국고분자학회, 1998-10-16 | |
| A study on evaporation of photogenerated acid and base additives in chemically amplified positive resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, 한국고분자학회 1998년도 추계 학술대회 , pp.264 - 265, 한국고분자학회, 1998-10 | |
| PED-Stabilized Chemically Amplified Resists Containing Basic Units in the Matrix Polymers Kim, Jin-Baek; Choi, Jae-Hak; Kwon, Young-Gil, 한국고분자학회 1998년도 춘계 학술대회, v.23, no.1, pp.114 - 115, 한국고분자학회, 1998-04-10 | |
| Synthesis of Copolymers Containing 3-Hydroxyclohexyl Methacrylate and Their Application as ArF Excimer Laser Resists Kim, Jae Young; Kim, Jin-Baek, 한국고분자학회 1998년도 추계 학술대회, pp.113 - 114, 한국고분자학회, 1998-04 | |
| Polyimide-Polysilsesquioxane Hybrid Composite Kim, Jin-Baek; Yoon, Kyung Hwan, 한국고분자학회 1998년도 추계 학술대회 , pp.253 - 254, 한국고분자학회, 1998-10 | |
| Acid Diffusion Control in Chemically Amplified Positive Resists Kwon, Young-Gil; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 1998년도 춘계 학술대회 , pp.36 - 37, 한국고분자학회, 1998-04 | |
| Synthesis and lithographic characterization of 1,4-dioxaspiro[4.7]dodecane-2-methyl methacrylate Kim, Jin-Baek; Jang, Ji Hyun; Park, Jong Jin, 한국고분자학회 1998년도 추계 학술대회 , pp.284 - 285, 한국고분자학회, 1998-10 | |
| New dry-developable chemically amplified photoresist Kim, Jin-Baek; Kim, Hyun-Woo, Advances in Resist Technology and Processing XV, pp.786 - 793, SPIE, 1998-02-23 |
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