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Showing results 1 to 10 of 10

1
Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235, 한국고분자학회, 1999-10

2
Adhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, Journal of Photopolymer Science and Technology, pp.629 - 634, 2000-01

3
Chemically amplified resists based on methacrylate polymers with cholic acid derivatives

Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2000년 춘계 학술대회, pp.0 - 0, 한국고분자학회, 2000-04

4
Chemically amplified resists based on the methacrylate polymers with cholic acid derivatives

Kim, Jin-Baek; Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil, 한국고분자학회 2000년 춘계 학술대회, pp.42 - 42, 한국고분자학회, 2000

5
Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives

Kim, Jin-Baek; Lee, Bum Wook, 한국고분자학회 1999년 춘계 학술대회, pp.66 - 66, 한국고분자학회, 1999

6
Copolymers of methacrylates with cholic acid derivatives and anhydrides for 193-nm photoresists

Ko, Jong Sung; Kim, Kyung Mi; Lee, Kwan Gu; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.156 - 156, 한국고분자학회, 2001-04-01

7
Diffusion and surface evaporation of photogenerated acid in basic polymers for PED Stability of ArF chemically amplified resists

Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.250 - 251, 한국고분자학회, 1999-10

8
Evaluation of Reactivity Ratios of Monomers in the Copolymerization of t-Butyl 3a-Methacryloyloxy-7a-Dihydroxy-5a-Cholan-24-oate and Maleic Anhydride

Kim, Jin-Baek; Ko, Jong-Sung; Lee, Bum Wook; Yun, Hyo-Jin, 한국고분자학회 2000년 춘계학술대회 , pp.68 - 68, 한국고분자학회, 2000

9
Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists

Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook, 한국고분자학회 2000년 춘계학술대회, pp.0 - 0, 한국고분자학회, 2000-04

10
The effects of functional group on cross-linking and shelf life of resists

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2000년 춘계학술대회, 한국고분자학회, 2000-04

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