Showing results 1 to 1 of 1
Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography Lee, Jae Jun; Kim, Jin-Baek; Honda, Kenji, Advances in Resist Technology and Processing XIX, pp.110 - 119, SPIE, 2002-03-04 |
Discover