DSpace at KOASAS: Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography

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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography

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Lee, Jae Jun / Kim, Jin-Baek researcher / Honda, Kenji

Publisher: SPIE

Issue Date: 2002-03-04

Language: English

Citation: Advances in Resist Technology and Processing XIX, pp.110 - 119

ISSN: 0277-786X

URI: http://hdl.handle.net/10203/135505

Appears in Collection: CH-Conference Papers(학술회의논문)

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Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography

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