Showing results 1 to 7 of 7
Dual responsive photoresists for sequential pattering by thermal imprint and photolithography Bak, Chang Hong; Choi, Soo-Young; Min, Chang Su; Kim, Jin-Baek, 2012 Advanced lithography, SPIE Advanced Lithography, 2012-02-14 |
Dually patterned self-assembled monolayers via silicon-containing block copolymer lithography on gold substrates and their applications Woo, Seung A; Choi, Soo-Young; Bak, Chang Hong; Jo, Gyeong Cheon; Kim, Jin-Baek, Frontiers in Polymer Science 2013, Elsevier, 2013-05-21 |
Fabrication of Functional Nanostructure Arrays Using Dual Responsive Nanoporous Templates Jung, Kyoung Ok; Bak, Chang Hong; Jo, Gyeong Cheon; Shin, Seung Min; Kim, Jin Baek, E-MRS 2014 SPRING MEETING, European Materials Research Society, 2014-05-26 |
Fabrication of functional nanostructure arrays using dually responsive block copolymer templates Jung, Kyoung Ok; Bak, Chang Hong; Jo, Gyeongcheon; Kim, Jin-Beak, Frontiers in polymer science, ELSEVIER, 2015-05-20 |
Fabrication of versatile nanoporous templates with high aspect ratios by incorporation of Si-containing block copolymers into the lithographic bilayer system Kim, Su Min; Ku, Se Jin; Jo, Gyeong Cheon; Bak, Chang Hong; Kim, Jin-Baek, Frontiers in Polymer Science 2013, Elsevier, 2013-05-21 |
Photo-cleavable cross-linked nanoporous templates with high aspect ratios using silicon-containing block copolymers and dual responsive photoresists Bak, Chang Hong; Jo, Gyeong Cheon; Jung, Kyoung Ok; Choi, Soo-Young; Kim, Jin-Baek, Frontiers in Polymer Science 2013, Elsevier, 2013-05-21 |
Universal templates for nanostructure arrays using silicon-containing block copolymers Jo, Gyeong Cheon; Bak, Chang Hong; Kim, Jin-Baek, 2012 Advanced lithography, SPIE Advanced Lithography, 2012-02-14 |
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