Photo-cleavable cross-linked nanoporous templates with high aspect ratios using silicon-containing block copolymers and dual responsive photoresists

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Publisher
Elsevier
Issue Date
2013-05-21
Language
ENG
Citation

Frontiers in Polymer Science 2013

URI
http://hdl.handle.net/10203/192210
Appears in Collection
CH-Conference Papers(학술회의논문)
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