Browse "MS-Journal Papers(저널논문)" by Subject resistivity
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| A study on the crystallographic orientation with residual stress and electrical property of Al films deposited by sputtering Kim, SP; Choi, HM; Choi, Si-Kyung, THIN SOLID FILMS, v.322, no.1-2, pp.298 - 302, 1998-06 |
| Composition and electrical properties of metallic Ru thin films deposited using Ru(C6H6)(C6H8) precursor Choi, J; Choi, Y; Hong, J; Tian, H; Roh, JS; Kim, Y; Chung, TM; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, pp.6852 - 6856, 2002-11 |
| Effect of the deposition geometry on the electrical properties within Tin-doped indium oxide film deposited under a given RF magnetron sputtering condition You, DJ; Choi, Si-Kyung; Han, HS; Lee, JS; Lim, CB, THIN SOLID FILMS, v.401, no.1-2, pp.229 - 234, 2001-12 |
| Effects of the partial pressure of copper (I) hexafluoroacetylacetonate trimethylvinylsilane on the chemical vapor deposition of copper Lee, SY; Rha, SK; Lee, WJ; Kim, DW; Hwang, JS; Park, Chong-Ook, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.36, pp.5249 - 5252, 1997-01 |
| Influence of film density on residual stress and resistivity for Cu thin films deposited by bias sputtering Choi, HM; Choi, Si-Kyung; Anderson, O; Bange, K, THIN SOLID FILMS, v.358, no.1-2, pp.202 - 205, 2000-01 |
| Metallorganic chemical vapor deposition of metallic Ru thin films on biaxially textured Ni substrates using a Ru(EtCp)(2) precursor Tian, HY; Chan, HLW; Choy, CL; Choi, JW; No, Kwangsoo, MATERIALS CHEMISTRY AND PHYSICS, v.93, pp.142 - 148, 2005-09 |
| Structural and electrical characteristics of highly textured oxidation-free Ru thin films by DC magnetron sputtering Tian, HY; Wang, Y; Chan, HLW; Choy, CL; No, Kwangsoo, JOURNAL OF ALLOYS AND COMPOUNDS, v.392, pp.231 - 236, 2005-04 |
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