Composition and electrical properties of metallic Ru thin films deposited using Ru(C6H6)(C6H8) precursor

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Metallic ruthenium films were prepared by metalorganic chemical vapor deposition (CVD) using a new precursor named (eta(6)-benzene)(eta(4)-1,3-cyclohexadiene)ruthenium (Ru(C6H6)C6H8)) in Ar atmosphere, and the absolute composition and electrical properties were investigated. The absolute composition including hydrogen was determined by means of the elastic recoil detection time of flight (ERD-TOF). It was found that carbon contents in the films markedly decreased when tetrahydrofuran (THF) was supplied with the precursor during deposition. The variation in carbon content could be interpreted by the formation of hydrocarbon compounds as well as the formation of carbon oxide, resulting from the reaction between carbon and THF. In particular, Ru films contained hydrogen that originated in the hydrogen atoms in the precursor and was involved in the CVD process due to the catalytic effect of ruthenium on hydrocarbon and hydrogen. It was shown that grain size, among several other factors strongly affected the electrical properties of ruthenium films. [DOI: 10.1143/JJAP.41.6852]
Publisher
Japan Soc Applied Physics
Issue Date
2002-11
Language
English
Article Type
Article; Proceedings Paper
Keywords

CHEMICAL-VAPOR-DEPOSITION; ELECTRODES

Citation

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, pp.6852 - 6856

ISSN
0021-4922
URI
http://hdl.handle.net/10203/7903
Appears in Collection
MS-Journal Papers(저널논문)
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