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Effects of Al Precursors on the Characteristics of Indium-Aluminum Oxide Semiconductor Grown by Plasma-Enhanced Atomic Layer Deposition Lee, Seunghee; Kim, Miso; Mun, Geumbi; Ko, Jongbeom; Yeom, Hye-In; Lee, Gwang-Heum; Shong, Bonggeun; et al, ACS APPLIED MATERIALS & INTERFACES, v.13, no.33, pp.40134 - 40144, 2021-08 |
High-performance oxide thin-film diode and its conduction mechanism based on ALD-assisted interface engineering Yeom, Hye-In; Kim, Jingyu; Jeon, Guk-Jin; Park, Jeongwoo; Han, Dong Uk; Kim, Joohyeong; Kim, Kyung Min; et al, JOURNAL OF MATERIALS CHEMISTRY C, v.11, no.4, pp.1336 - 1345, 2023-02 |
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