Browse "MS-Conference Papers(학술회의논문)" by Author Baik, KH
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| Effects of the addition of CF4, Cl2, and N2 to O2 ECR plasma on the etch rate, selectivity, and etched profile of RuO2 film Lee, EJ; Kim, JS; Kim, JW; Baik, KH; Lee, Won-Jong, Proceedings of the 1997 MRS Fall Symposium, v.493, pp.183 - 188, 1997-11-30 |
| The effects of the addition of CF4, Cl2 and N2 to oxygen ECR plasma on the etch rates, selectivities, and etched profiles of RuO2 films Lee, Won-Jong; LEE, EJ; Kim, JS; Kim, JW; Baik, KH, Proceedings of the Materials Research Society Symposium, pp.183 - 188, 1997-01-01 |
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