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EFFECT OF CO AND CO2 ADDITION TO THE CF4/O-2 GAS SYSTEM ON THE ETCHING OF A LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION TUNGSTEN FILM KWON, SK; KIM, KN; NAM, CW; Woo, Seong-Ihl, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.13, no.3, pp.914 - 917, 1995-05 |
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