Plasma Etching Antenna Effect on Oxide-Silicon Interface Reliability
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | H. Shin | ko |
| dc.contributor.author | C. Hu | ko |
| dc.date.accessioned | 2013-02-25T03:56:41Z | - |
| dc.date.available | 2013-02-25T03:56:41Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1993-02 | - |
| dc.identifier.citation | SOLID-STATE ELECTRONICS, v.36, no.9, pp.1356 - 1358 | - |
| dc.identifier.issn | 0038-1101 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/59671 | - |
| dc.language | English | - |
| dc.publisher | Pergamon-Elsevier Science Ltd | - |
| dc.subject | DAMAGE | - |
| dc.title | Plasma Etching Antenna Effect on Oxide-Silicon Interface Reliability | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1993LQ00700021 | - |
| dc.identifier.scopusid | 2-s2.0-0027656150 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 36 | - |
| dc.citation.issue | 9 | - |
| dc.citation.beginningpage | 1356 | - |
| dc.citation.endingpage | 1358 | - |
| dc.citation.publicationname | SOLID-STATE ELECTRONICS | - |
| dc.identifier.doi | 10.1016/0038-1101(93)90178-S | - |
| dc.contributor.localauthor | H. Shin | - |
| dc.contributor.nonIdAuthor | C. Hu | - |
| dc.type.journalArticle | Note | - |
| dc.subject.keywordPlus | DAMAGE | - |
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