DC Field | Value | Language |
---|---|---|
dc.contributor.author | H. Kim | ko |
dc.contributor.author | Kim, Chong Hee | ko |
dc.date.accessioned | 2013-02-24T14:47:17Z | - |
dc.date.available | 2013-02-24T14:47:17Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1984 | - |
dc.identifier.citation | JOURNAL OF MATERIALS SCIENCE LETTERS, v.3, pp.201 - 202 | - |
dc.identifier.issn | 0261-8028 | - |
dc.identifier.uri | http://hdl.handle.net/10203/57983 | - |
dc.language | English | - |
dc.publisher | Chapman and Hall | - |
dc.title | The Role of Second Component Gases pm the Nitriding Rate of Si Compact | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 3 | - |
dc.citation.beginningpage | 201 | - |
dc.citation.endingpage | 202 | - |
dc.citation.publicationname | JOURNAL OF MATERIALS SCIENCE LETTERS | - |
dc.contributor.nonIdAuthor | H. Kim | - |
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