CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS OF FERROELECTRIC LEAD TITANATE
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | YOON, SG | ko |
| dc.contributor.author | Kim, Ho Gi | ko |
| dc.date.accessioned | 2013-02-24T13:01:04Z | - |
| dc.date.available | 2013-02-24T13:01:04Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1989 | - |
| dc.identifier.citation | FERROELECTRICS, v.89, pp.91 - 97 | - |
| dc.identifier.issn | 0015-0193 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/57327 | - |
| dc.language | English | - |
| dc.publisher | GORDON BREACH SCI PUBL LTD | - |
| dc.title | CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS OF FERROELECTRIC LEAD TITANATE | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1989AE52100012 | - |
| dc.identifier.scopusid | 2-s2.0-84914938237 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 89 | - |
| dc.citation.beginningpage | 91 | - |
| dc.citation.endingpage | 97 | - |
| dc.citation.publicationname | FERROELECTRICS | - |
| dc.identifier.doi | 10.1080/00150198908017888 | - |
| dc.contributor.localauthor | Kim, Ho Gi | - |
| dc.contributor.nonIdAuthor | YOON, SG | - |
| dc.type.journalArticle | Article | - |
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