Chemical Vapor Deposited Tungsten Mechanical Evaluation at High Temperature

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dc.contributor.authorChun, Soung Soonko
dc.contributor.authorNicholson, P.S.ko
dc.contributor.authorSosin, A.ko
dc.contributor.authorByrne, J.G.ko
dc.date.accessioned2013-02-24T12:16:38Z-
dc.date.available2013-02-24T12:16:38Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1972-
dc.identifier.citationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.118, pp.1492 - 1498-
dc.identifier.issn0013-4651-
dc.identifier.urihttp://hdl.handle.net/10203/57064-
dc.languageEnglish-
dc.publisherElectrochemical Soc Inc-
dc.titleChemical Vapor Deposited Tungsten Mechanical Evaluation at High Temperature-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume118-
dc.citation.beginningpage1492-
dc.citation.endingpage1498-
dc.citation.publicationnameJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.contributor.localauthorChun, Soung Soon-
dc.contributor.nonIdAuthorNicholson, P.S.-
dc.contributor.nonIdAuthorSosin, A.-
dc.contributor.nonIdAuthorByrne, J.G.-
dc.description.isOpenAccessN-
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