The Effects of Deposition Variables on the Electrical Properties of Silicon Nitride by CVD
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chun , Soung Soon | ko |
| dc.date.accessioned | 2013-02-24T12:06:41Z | - |
| dc.date.available | 2013-02-24T12:06:41Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1986 | - |
| dc.identifier.citation | JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, v.6, pp.3082 | - |
| dc.identifier.issn | 0734-2101 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/57013 | - |
| dc.language | English | - |
| dc.publisher | American Institute of Physics | - |
| dc.title | The Effects of Deposition Variables on the Electrical Properties of Silicon Nitride by CVD | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 6 | - |
| dc.citation.beginningpage | 3082 | - |
| dc.citation.publicationname | JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A | - |
| dc.contributor.localauthor | Chun , Soung Soon | - |
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