플라즈마 화학중착법, 이온 플레이팅법 및 반응성 스퍼터링방법에 증착된 TiN 박막의 특성 비교 연구A Comparative Study of the Characteristics of TiN Films Deposited by Plasma-Assisted CVD, Ion Plating and Reactive Sputtering
- Publisher
- 한국세라믹학회
- Issue Date
- 1994
- Language
- Korean
- Citation
한국세라믹학회지, v.31, no.7, pp.731 - 738
- ISSN
- 1229-7801
- Appears in Collection
- RIMS Journal Papers
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.