플라즈마 화학증착법, 이온 플레이팅법 및 반응성 스퍼터링법에 의해 증착된 TiN 박막의 특성 비교 연구A Comparative Study on the Characteristics of TiN Films Deposited by Plasma-Assisted CVD, Ion Plating and Reactive Sputtering

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dc.contributor.author안치범ko
dc.contributor.author정병진ko
dc.contributor.author이원종ko
dc.contributor.author천성순ko
dc.date.accessioned2013-02-24T09:51:54Z-
dc.date.available2013-02-24T09:51:54Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1994-04-
dc.identifier.citation한국세라믹학회지, v.31, no.7, pp.731 - 738-
dc.identifier.issn1229-7801-
dc.identifier.urihttp://hdl.handle.net/10203/56215-
dc.description.abstractTiN films were deposited on high speed steels by plasma assisted chemical vapor deposition (PACVD), cathode arc ion plating (CAIP) and reactive magnetron sputtering (RMS). The properties of the films deposited by the three different methods were compared. The preferred oriented plane of PACVD-TiN is (200) and those of CAIP-TiN and RMS-TiN are (111). PACVD-TiN shows a dome surface and a microstructure having small grains. CAIP-TiN shows the highest microhardness and the best adhesion strength of the three because it has a dense microstructure and an ill-defined interface. But is shows the greatest surface roughness due to the Ti droplet created by the arc. RMS-TiN shows a microstructure having large voids so that its properties in microhardness and adhesion are the worst of the three.-
dc.languageKorean-
dc.publisher한국세라믹학회-
dc.title플라즈마 화학증착법, 이온 플레이팅법 및 반응성 스퍼터링법에 의해 증착된 TiN 박막의 특성 비교 연구-
dc.title.alternativeA Comparative Study on the Characteristics of TiN Films Deposited by Plasma-Assisted CVD, Ion Plating and Reactive Sputtering-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume31-
dc.citation.issue7-
dc.citation.beginningpage731-
dc.citation.endingpage738-
dc.citation.publicationname한국세라믹학회지-
dc.contributor.localauthor이원종-
dc.contributor.nonIdAuthor안치범-
dc.contributor.nonIdAuthor정병진-
dc.contributor.nonIdAuthor천성순-
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MS-Journal Papers(저널논문)
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