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Showing results 1 to 7 of 7

1
Chemically Amplified Resist based on the Norbornene Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group

Kim, Jin-Baek; Kang, Jae-Sung, 한국고분자학회 1999년 춘계 학술대회 , pp.209 - 209, 한국고분자학회, 1999

2
Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives

Kim, Jin-Baek; Lee, Bum-Wook; Kang, Jae-Sung, SPIE-The International Society for Optical Engineering, pp.36 - 43, SPIE, 1999-01

3
Chemically amplified resists based on the norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group

Kim, Jin-Baek; Lee, Jae Jun; Kang, Jae-Sung, Advances in Resist Technology and Processing XVII, pp.1079 - 1087, SPIE, 2000-02-28

4
Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns

Kim, Jin-Baek; Lee, Jae Jun; Kang, Jae-Sung

5
Syntheses of new mesoionrc compounds = 새로운메소이온 화합물의 합성link

Kang, Jae-Sung; 강재성; Oh, Dong-Young; Kim, Sung-Gak; et al, 한국과학기술원, 1987

6
Synthesis of norbornene copolymers with acid labile organosilicon protecting groups and their application as dry-developable photoresists for ArF lithography = 산촉매에 의해 분해되는 유기 실리콘기를 노르보넨 측쇄에 함유하는 공중합체의 합성과 건식현상형 포토레지스트로서의 응용link

Kang, Jae-Sung; 강재성; et al, 한국과학기술원, 2000

7
Synthesis of some heterocyclic organophosphorus compounds containing elctron-withdrawing group = 전자 끄는 기를 가진 헤테로고리 유기인 화합물의 합성link

Kang, Jae-Sung; 강재성; et al, 한국과학기술원, 1984

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