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Control of plasma parameters using grid voltage biasing and inert gas mixing in inductively coupled plasma = 유도결합 플라즈마에서 그리드 및 비활성 기체 혼합을 이용한 플라즈마 변수 제어link Bai, Keun-Hee; 배근희; et al, 한국과학기술원, 2002 |
Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06 |
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