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Showing results 1 to 3 of 3

1
Electron temperature control with a small mesh number grid in inductively coupled plasmas

Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11

2
Electron temperature control with grid bias in inductively coupled argon plasma

Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03

3
Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma

Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06

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