Showing results 1 to 5 of 5
Effects of substrate bias voltage on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09 |
Electron temperature control with grid bias in inductively coupled argon plasma Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03 |
Fast measurement of a pulsed plasma using a Fourier cutoff probe Na, Byung-Keun; You, Kwang-Ho; Kim, D. -W.; Seo, Byong-Hoon; Chang, Hong-Young; You, S. -J.; Lee, Yun-Seong, JOURNAL OF INSTRUMENTATION, v.7, 2012-04 |
Measurements of Electron Energy Probability Functions in inductively coupled plasma with laser Thomson scattering Seo, B. H.; You, S. J.; You, G. H.; Kim, J. H.; Yoo, Y. S.; Seong, D. J.; Chang, H. Y., JOURNAL OF INSTRUMENTATION, v.7, 2012-01 |
Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07 |
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