플라즈마 화학 증착법으로 제조된 P-doped μc-Si:H 박막의 특성 = Properties of phosphorus-doped μc-Si:H thin films by PECVD

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Advisors
임호빈researcherIm, Ho-Binresearcher
Description
한국과학기술원 : 전자재료공학과,
Publisher
한국과학기술원
Issue Date
1993
Identifier
68557/325007 / 000911463
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 전자재료공학과, 1993.2, [ v, 62 p. ]

URI
http://hdl.handle.net/10203/51231
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68557&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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