광리소그래픽 위상변위마스크용 Si-O-N-F 박막의 모사연구, 증착 과 특성분석Simulation and characterization of silicon oxynitrofluoride films as a phase shift mask material
- Advisors
- 노광수researcher; No, Kwang-Sooresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2002
- Identifier
- 174023/325007 / 020003561
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 2002.2, [ viii, 81 p. ]
- Keywords
광리소그래피; 위상변위 마스크; phase shift mask; silicon oxynitrofluoride; optical lithography
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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