광리소그래픽 위상변위마스크용 Si-O-N-F 박막의 모사연구, 증착 과 특성분석Simulation and characterization of silicon oxynitrofluoride films as a phase shift mask material
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 노광수 | - |
| dc.contributor.advisor | No, Kwang-Soo | - |
| dc.contributor.author | 최은철 | - |
| dc.contributor.author | Choi, Eun-Chul | - |
| dc.date.accessioned | 2011-12-15T01:34:45Z | - |
| dc.date.available | 2011-12-15T01:34:45Z | - |
| dc.date.issued | 2002 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=174023&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50887 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 2002.2, [ viii, 81 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 광리소그래피 | - |
| dc.subject | 위상변위 마스크 | - |
| dc.subject | phase shift mask | - |
| dc.subject | silicon oxynitrofluoride | - |
| dc.subject | optical lithography | - |
| dc.title | 광리소그래픽 위상변위마스크용 Si-O-N-F 박막의 모사연구, 증착 과 특성분석 | - |
| dc.title.alternative | Simulation and characterization of silicon oxynitrofluoride films as a phase shift mask material | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 174023/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 020003561 | - |
| dc.contributor.localauthor | 노광수 | - |
| dc.contributor.localauthor | No, Kwang-Soo | - |
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