고집적 FRAM용 LSCO/Ir/TaSiN 하부전극의 안정성에 관한 연구 = Stability of TaSiN diffusion barrier with LSCO/Ir hybrid bottom electrode for FRAM application

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Advisors
김호기researcherKim, Hi-Giresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2001
Identifier
165562/325007 / 000993074
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 2001.2, [ iv, 77 p. ]

Keywords

확산방지막; TaSiN; LSCO; Barrier

URI
http://hdl.handle.net/10203/50819
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165562&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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