고집적 FRAM용 LSCO/Ir/TaSiN 하부전극의 안정성에 관한 연구Stability of TaSiN diffusion barrier with LSCO/Ir hybrid bottom electrode for FRAM application

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dc.contributor.advisor김호기-
dc.contributor.advisorKim, Hi-Gi-
dc.contributor.author김명선-
dc.contributor.authorKim, Myung-Sun-
dc.date.accessioned2011-12-15T01:33:37Z-
dc.date.available2011-12-15T01:33:37Z-
dc.date.issued2001-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165562&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50819-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 2001.2, [ iv, 77 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject확산방지막-
dc.subjectTaSiN-
dc.subjectLSCO-
dc.subjectBarrier-
dc.title고집적 FRAM용 LSCO/Ir/TaSiN 하부전극의 안정성에 관한 연구-
dc.title.alternativeStability of TaSiN diffusion barrier with LSCO/Ir hybrid bottom electrode for FRAM application-
dc.typeThesis(Master)-
dc.identifier.CNRN165562/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000993074-
dc.contributor.localauthor김호기-
dc.contributor.localauthorKim, Hi-Gi-
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MS-Theses_Master(석사논문)
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