스퍼터링법으로 증착한 알루미늄 박막의 잔류응력에 따른 결정 배향성이 전기적성질에 미치는 영향Effect of crystallographic orientation affected by residual stress on electrical property of Al thin films deposited by sputtering
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1997
- Identifier
- 113129/325007 / 000953067
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1997.2, [ iv, 62 p. ]
- Keywords
비저항; 잔류응력; 배향도; 알루미늄 박막; 스퍼터링; Sputtering; Resistivity; Residual stress; Orientation; Al thin film
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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