RF magnetron sputtering 증착공정에서 플라즈마 특성과 비정질 $CN_x$ 박막성질의 상관관계에 관한 연구 = A study on the correlation between the plasma and amorphous $CN_x$ film characteristics using RF magnetron sputtering

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 352
  • Download : 0
Advisors
최시경researcherChoi, Si-Kyungresearcher
Description
한국과학기술원 : 신소재공학과,
Publisher
한국과학기술원
Issue Date
2011
Identifier
466401/325007  / 020055825
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 신소재공학과, 2011.2, [ vii, 73 p. ]

Keywords

경도; 마그네트론 스퍼터링; 플라즈마; 질화탄소박막; 퓨리에변환 `적외선 분광 감지법; FTIR; hardness; magnetron sputtering; plasma; Carbon nitride

URI
http://hdl.handle.net/10203/49665
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=466401&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0