UV submicron lithography 를 위한 4반사광학계의 설계 및 수차해석Design and analysis of the four mirror optical system for UV submicron lithography

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dc.contributor.advisor이상수-
dc.contributor.advisorLee, Sang-Soo-
dc.contributor.author박성찬-
dc.contributor.authorPark, Sung-Chan-
dc.date.accessioned2011-12-14T07:31:36Z-
dc.date.available2011-12-14T07:31:36Z-
dc.date.issued1991-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=61842&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/47829-
dc.description학위논문(박사) - 한국과학기술원 : 물리학과, 1991.2, [ iii, 86 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.titleUV submicron lithography 를 위한 4반사광학계의 설계 및 수차해석-
dc.title.alternativeDesign and analysis of the four mirror optical system for UV submicron lithography-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN61842/325007-
dc.description.department한국과학기술원 : 물리학과, -
dc.identifier.uid000865147-
dc.contributor.localauthor박성찬-
dc.contributor.localauthorPark, Sung-Chan-
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PH-Theses_Ph.D.(박사논문)
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