Theoretical studies of inductively coupled plasma source and enhanced plasma heating in a weak external magnetic field = 유도결합 플라즈마에 대한 이론적 고찰과 약한 외부자장 하에서의 플라즈마 가열효과 향상 연구

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A one-dimensional analysis of electron heating process in a weakly magnetized, inductively coupled plasma (MICP) is presented. It is found that the main difference in the heating process of an MICP from that of a usual unmagnetized ICP is in that circularly polarized wave modes can exist in the plasma. The right handed circularly polarized wave (R-wave) can propagate into the plasma and its amplitude can be enhanced by cavity resonance effect at an appropriate chamber length and external magnetic field strength. The enhanced R-wave amplitude can raise the heating efficiency significantly. It is also found that a bounce cyclotron-resonance effect can exist, which, however, is not as significant as the cavity resonance effect. A new antenna configuration for uniform plasma generation in large-area inductively coupled plasma (ICP) source is presented and investigated using numerical analysis. The numerical results show that a properly tuned segmented coil system with an external variable capacitor can allow antenna current distribution and plasma uniformity to be controlled in the large-area ICP source. The key element of this new concept is to induce LC-resonance in the coil system by the external capacitance variation. Through the LC-resonance, a selected coil current near a low plasma density regime can be significantly enhanced. Self-consistent fluid simulations for Ar and Cl$_2$ plasmas indicate that the radial plasma spread can be optimized near the LC-resonance condition. A self-consistent model has been developed to investigate electron heating, plasma transport, and etching charateristics in a large-area inductively coupled plasma (ICP) source. The new LC-resonance type antenna for uniform plasma etching in the large-area ICP source is investigated using the developed model. % show that the new antenna configuration, which is a properly tuned segmented coil system with an external variable capacitor, can allow the etching uniformity to be controlled in th...
Advisors
Chang, Choong-Seockresearcher장충석researcher
Description
한국과학기술원 : 물리학과,
Publisher
한국과학기술원
Issue Date
1999
Identifier
156101/325007 / 000955050
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 물리학과, 1999.8, [ xii, 134 p. ]

URI
http://hdl.handle.net/10203/47214
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=156101&flag=dissertation
Appears in Collection
PH-Theses_Ph.D.(박사논문)
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