DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Chang, Choong-Seock | - |
dc.contributor.advisor | 장충석 | - |
dc.contributor.author | Kim, Sung-Sik | - |
dc.contributor.author | 김성식 | - |
dc.date.accessioned | 2011-12-14T07:21:52Z | - |
dc.date.available | 2011-12-14T07:21:52Z | - |
dc.date.issued | 1999 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=156101&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/47214 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 물리학과, 1999.8, [ xii, 134 p. ] | - |
dc.description.abstract | A one-dimensional analysis of electron heating process in a weakly magnetized, inductively coupled plasma (MICP) is presented. It is found that the main difference in the heating process of an MICP from that of a usual unmagnetized ICP is in that circularly polarized wave modes can exist in the plasma. The right handed circularly polarized wave (R-wave) can propagate into the plasma and its amplitude can be enhanced by cavity resonance effect at an appropriate chamber length and external magnetic field strength. The enhanced R-wave amplitude can raise the heating efficiency significantly. It is also found that a bounce cyclotron-resonance effect can exist, which, however, is not as significant as the cavity resonance effect. A new antenna configuration for uniform plasma generation in large-area inductively coupled plasma (ICP) source is presented and investigated using numerical analysis. The numerical results show that a properly tuned segmented coil system with an external variable capacitor can allow antenna current distribution and plasma uniformity to be controlled in the large-area ICP source. The key element of this new concept is to induce LC-resonance in the coil system by the external capacitance variation. Through the LC-resonance, a selected coil current near a low plasma density regime can be significantly enhanced. Self-consistent fluid simulations for Ar and Cl$_2$ plasmas indicate that the radial plasma spread can be optimized near the LC-resonance condition. A self-consistent model has been developed to investigate electron heating, plasma transport, and etching charateristics in a large-area inductively coupled plasma (ICP) source. The new LC-resonance type antenna for uniform plasma etching in the large-area ICP source is investigated using the developed model. % show that the new antenna configuration, which is a properly tuned segmented coil system with an external variable capacitor, can allow the etching uniformity to be controlled in th... | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.title | Theoretical studies of inductively coupled plasma source and enhanced plasma heating in a weak external magnetic field | - |
dc.title.alternative | 유도결합 플라즈마에 대한 이론적 고찰과 약한 외부자장 하에서의 플라즈마 가열효과 향상 연구 | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 156101/325007 | - |
dc.description.department | 한국과학기술원 : 물리학과, | - |
dc.identifier.uid | 000955050 | - |
dc.contributor.localauthor | Kim, Sung-Sik | - |
dc.contributor.localauthor | 김성식 | - |
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