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Interface model for HfO2 gate stack from first principles calculations and its application to nanoscale device simulations Shin, Mincheol; Park, Yongjin; Kong, Ki-jeong; Chang, Hyunju, APPLIED PHYSICS LETTERS, v.98, no.17, pp.173501, 2011-04 |
Power Gating: Circuits, Design Methodologies, and Best Practice for Standard-Cell VLSI Designs Shin, Young-Soo; Seomun, Jun; Choi, Kyu-Myung; Sakurai, Takayasu, ACM TRANSACTIONS ON DESIGN AUTOMATION OF ELECTRONIC SYSTEMS, v.15, no.4, 2010-09 |
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