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Large marginal 2D self-aligned via patterning for sub-5nm technology

Choi, Suhyeong; Lee, Jae Uk; Caballo, Victor M. Blanco; Debacker, Peter; Raghavan, Praveen; Kim, Ryoung-Han; Shin, Youngsoo, SPIE Advanced Lithography, SPIE, 2017-02-26

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