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Growth and characterization of hafnium oxide thin films prepared by MOCVD

Cho, Byung Jin; Fong, CS; Wei, VLS; Krishnam, RG; Trigg, A; Bera, LK; Mathew, S, 2003 International conference on Characterisation and Metrology for ULSI technology, pp.176 - 180, 2003-03-24

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