Growth and characterization of hafnium oxide thin films prepared by MOCVDGrowth and characterization of hafnium oxide thin films prepared by MOCVD

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Issue Date
2003-03-24
Language
ENG
Citation

2003 International conference on Characterisation and Metrology for ULSI technology, pp.176 - 180

URI
http://hdl.handle.net/10203/146825
Appears in Collection
EE-Conference Papers(학술회의논문)
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