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Showing results 1 to 6 of 6

1
2D self-aligned via patterning strategy with EUV single exposure in 3nm technology

Choi, Suhyeong; Lee, Jae Uk; Carballo, Victor M. Blanco; Kim, Ryoung-Han; Shin, Youngsoo, Conference on Extreme Ultraviolet (EUV) Lithography VIII, SPIE, 2017-02-26

2
Area efficient neuromorphic circuit based on stochastic computation

Yoon, Kiwon; Choi, Suhyeong; Shin, Youngsoo, 13th International SoC Design Conference, ISOCC 2016, pp.73 - 74, Institute of Electrical and Electronics Engineers Inc., 2016-10-23

3
Large marginal 2D self-aligned via patterning for sub-5nm technology

Choi, Suhyeong; Lee, Jae Uk; Caballo, Victor M. Blanco; Debacker, Peter; Raghavan, Praveen; Kim, Ryoung-Han; Shin, Youngsoo, SPIE Advanced Lithography, SPIE, 2017-02-26

4
Machine learning (ML)-based lithography optimizations

Shin, Youngsoo; Shim, Seongbo; Choi, Suhyeong, IEEE Asia Pacific Conference on Circuits and Systems, IEEE, 2016-10-25

5
Machine learning-based 3D resist model

Shim, Seongbo; Choi, Suhyeong; Shin, Youngsoo, SPIE Advanced Lithography, SPIE, 2017-02-26

6
Machine learning-based resist 3D model

Shim, Seongbo; Choi, Suhyeong; Shin, Youngsoo, Optical Microlithography XXX 2017, SPIE, 2017-02

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