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Molybdenum-gate HfO2 CMOS FinFET technology

Ha, D.; Takeuchi, H.; Choi, Yang-Kyu; King, T.-J.; Bai, W.P.; Kwong, D.-L.; Agarwal, A.; et al, IEEE International Electron Devices Meeting, 2004 IEDM, pp.643 - 646, IEEE, 2004-12-13

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