ECR $N_2O$-플라즈마 산화 및 응용Ecr $N_2O$-plasma oxidation and its applications
- Advisors
- 이희철researcher; Lee, Hee-Chulresearcher
- Description
- 한국과학기술원 : 전기 및 전자공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1996
- Identifier
- 106401/325007 / 000943446
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 전기 및 전자공학과, 1996.2, [ iv, 85 p. ]
- Keywords
다결정 실리콘; 얇은 게이트 산화막; 질화 산화막; ECR N2O-플라즈마; 다결정 산화막; Polyoxide; Polysilicon TFT; Thin gate oxide; Oxynitride; ECR N2O-Plasma
- Appears in Collection
- EE-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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