ECR $N_2O$-플라즈마 산화 및 응용 = Ecr $N_2O$-plasma oxidation and its applications

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dc.contributor.advisor이희철-
dc.contributor.advisorLee, Hee-Chul-
dc.contributor.author이진우-
dc.contributor.authorLee, Jin-Woo-
dc.date.accessioned2011-12-14T01:39:10Z-
dc.date.available2011-12-14T01:39:10Z-
dc.date.issued1996-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=106401&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/36869-
dc.description학위논문(석사) - 한국과학기술원 : 전기 및 전자공학과, 1996.2, [ iv, 85 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject다결정 실리콘-
dc.subject얇은 게이트 산화막-
dc.subject질화 산화막-
dc.subjectECR N2O-플라즈마-
dc.subject다결정 산화막-
dc.subjectPolyoxide-
dc.subjectPolysilicon TFT-
dc.subjectThin gate oxide-
dc.subjectOxynitride-
dc.subjectECR N2O-Plasma-
dc.titleECR $N_2O$-플라즈마 산화 및 응용 = Ecr $N_2O$-plasma oxidation and its applications-
dc.typeThesis(Master)-
dc.identifier.CNRN106401/325007-
dc.description.department한국과학기술원 : 전기 및 전자공학과, -
dc.identifier.uid000943446-
dc.contributor.localauthor이희철-
dc.contributor.localauthorLee, Hee-Chul-
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EE-Theses_Master(석사논문)
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