Study of silicon-treated and silicon-containing block copolymers for patterning of $SiO_2$ nanostructures무기물의 나노 구조 패터닝을 위한 실리콘 함유와 실리콘 처리 블록 공중합체에 관한 연구

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dc.contributor.advisorKim, Jin-Baek-
dc.contributor.advisor김진백-
dc.contributor.authorKim, Su-Min-
dc.contributor.author김수민-
dc.date.accessioned2011-12-13T04:31:51Z-
dc.date.available2011-12-13T04:31:51Z-
dc.date.issued2010-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=418721&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/31746-
dc.description학위논문(박사) - 한국과학기술원 : 화학과, 2010.2, [ xii, 93 p. ]-
dc.description.abstract$\Bf{ Silicon-Treated Block Copolymers for $SiO_2$ Nanostructures}$ Surfaces patterned with regularly sized and spaced features at the nanoscopic level have attracted much interest over the last decade. The inherent variety of block copolymers makes their self-assembly an attractive means of creating such surfaces and they have been used as effective and versatile templates for many inorganic materials. Silicon oxide ($SiO_2$) in particular has demonstrated tremendous promise in applications ranging from microelectronics to photonic devices. First, highly dense $SiO_2$ nanodot arrays were fabricated via a selective chemical reaction with a functionalized block copolymer template. Polystyrene-$\It{b}-poly(acrylic acid/acrylic anhydride) (PS-$\It{b}-PAA/AN) thin films on an SU-8 photoresist, generated from polystyrene-$\It{b}-poly($\It{tert}-butylacrylate) (PS-$\It{b}-PtBA) by acid-catalyzed thermal deprotection, were used as templates. Due to the presence of PAA/AN nanodomains with carboxylic acids cross-linked by anhydride linkages, these templates acted as robust and versatile scaffolds with excellent solvent and thermal resistance. Hexamethyldisilazane (HMDS) was spin-sprayed uniformly over the entire surface of the self-assembled PS-$\It{b}-PAA/AN film and reacted selectively with carboxylic acids in the spherical domains of PAA/AN. RIE in an $O_2/Ar$ atmosphere removed all organic components, resulting in arrays of free-standing silica nanostructures over a wide area of the substrate. Secondly, the self-assembly of an amine-terminated polydimethylsiloxane (PDMS) via the noncovelent interactions onto the functionalized block copolymer template was used to silicon oxide nanodot arrays. This method could make a possible not only to increase contents of silicon but also to simplify a whole process. PS-$\It{b}-PAA/AN thin films on an SU-8 photoresist were dipped on the amine-terminated PDMS solution and PDMS was self-assembled selectively onto the spheric...eng
dc.languageeng-
dc.publisher한국과학기술원-
dc.subjectself hard mask-
dc.subjectsilicon block copolymer-
dc.subjectfunctionalized block copolymer-
dc.subjectsilicon oxide-
dc.subjecthigh aspect ratio nanohole-
dc.subject높은 종횡비를 가지는 나노홀-
dc.subject자체 마스크-
dc.subject실리콘 블록 공중합체-
dc.subject기능성 블록 공중합체-
dc.subject유무기복합체-
dc.titleStudy of silicon-treated and silicon-containing block copolymers for patterning of $SiO_2$ nanostructures-
dc.title.alternative무기물의 나노 구조 패터닝을 위한 실리콘 함유와 실리콘 처리 블록 공중합체에 관한 연구-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN418721/325007 -
dc.description.department한국과학기술원 : 화학과, -
dc.identifier.uid020065033-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.localauthor김진백-
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