DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Kim, Jin-Baek | - |
dc.contributor.advisor | 김진백 | - |
dc.contributor.author | Kim, Su-Min | - |
dc.contributor.author | 김수민 | - |
dc.date.accessioned | 2011-12-13T04:31:51Z | - |
dc.date.available | 2011-12-13T04:31:51Z | - |
dc.date.issued | 2010 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=418721&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/31746 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 화학과, 2010.2, [ xii, 93 p. ] | - |
dc.description.abstract | $\Bf{ Silicon-Treated Block Copolymers for $SiO_2$ Nanostructures}$ Surfaces patterned with regularly sized and spaced features at the nanoscopic level have attracted much interest over the last decade. The inherent variety of block copolymers makes their self-assembly an attractive means of creating such surfaces and they have been used as effective and versatile templates for many inorganic materials. Silicon oxide ($SiO_2$) in particular has demonstrated tremendous promise in applications ranging from microelectronics to photonic devices. First, highly dense $SiO_2$ nanodot arrays were fabricated via a selective chemical reaction with a functionalized block copolymer template. Polystyrene-$\It{b}-poly(acrylic acid/acrylic anhydride) (PS-$\It{b}-PAA/AN) thin films on an SU-8 photoresist, generated from polystyrene-$\It{b}-poly($\It{tert}-butylacrylate) (PS-$\It{b}-PtBA) by acid-catalyzed thermal deprotection, were used as templates. Due to the presence of PAA/AN nanodomains with carboxylic acids cross-linked by anhydride linkages, these templates acted as robust and versatile scaffolds with excellent solvent and thermal resistance. Hexamethyldisilazane (HMDS) was spin-sprayed uniformly over the entire surface of the self-assembled PS-$\It{b}-PAA/AN film and reacted selectively with carboxylic acids in the spherical domains of PAA/AN. RIE in an $O_2/Ar$ atmosphere removed all organic components, resulting in arrays of free-standing silica nanostructures over a wide area of the substrate. Secondly, the self-assembly of an amine-terminated polydimethylsiloxane (PDMS) via the noncovelent interactions onto the functionalized block copolymer template was used to silicon oxide nanodot arrays. This method could make a possible not only to increase contents of silicon but also to simplify a whole process. PS-$\It{b}-PAA/AN thin films on an SU-8 photoresist were dipped on the amine-terminated PDMS solution and PDMS was self-assembled selectively onto the spheric... | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | self hard mask | - |
dc.subject | silicon block copolymer | - |
dc.subject | functionalized block copolymer | - |
dc.subject | silicon oxide | - |
dc.subject | high aspect ratio nanohole | - |
dc.subject | 높은 종횡비를 가지는 나노홀 | - |
dc.subject | 자체 마스크 | - |
dc.subject | 실리콘 블록 공중합체 | - |
dc.subject | 기능성 블록 공중합체 | - |
dc.subject | 유무기복합체 | - |
dc.title | Study of silicon-treated and silicon-containing block copolymers for patterning of $SiO_2$ nanostructures | - |
dc.title.alternative | 무기물의 나노 구조 패터닝을 위한 실리콘 함유와 실리콘 처리 블록 공중합체에 관한 연구 | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 418721/325007 | - |
dc.description.department | 한국과학기술원 : 화학과, | - |
dc.identifier.uid | 020065033 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.localauthor | 김진백 | - |
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