Contact properties of a low-resistance aluminum-based electrode with metal capping layers in vertical oxide thin-film transistors

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dc.contributor.authorJeon, Soriko
dc.contributor.authorLee, Kwang-Heumko
dc.contributor.authorLee, Seung-Heeko
dc.contributor.authorCho, Seong-Inko
dc.contributor.authorHwang, Chi-Sunko
dc.contributor.authorKo, Jong Beomko
dc.contributor.authorPark, Sang-Hee Koko
dc.date.accessioned2023-11-06T03:01:27Z-
dc.date.available2023-11-06T03:01:27Z-
dc.date.created2023-10-16-
dc.date.issued2023-10-
dc.identifier.citationJOURNAL OF MATERIALS CHEMISTRY C, v.11, no.41, pp.14177 - 14186-
dc.identifier.issn2050-7526-
dc.identifier.urihttp://hdl.handle.net/10203/314275-
dc.description.abstractThin-film transistors (TFTs) with a small pitch size are necessary to realize high-resolution displays for virtual reality and augmented reality applications. Particularly, electrodes require low-resistance metals to reduce the resistance-capacitance delay caused by the increased pixel density. However, low-resistance Al can easily oxidize in bottom-contact structures of vertical TFTs owing to the oxidative deposition environment. This study quantitatively analyzed the contact properties of an Al-based metal with Mo and Ti capping layers. The Mo/Al/Mo and Ti/Al/Ti were adopted as the source/drain (S/D) electrodes, and their contact properties were compared. The top-gate bottom-contact device with Mo/Al/Mo S/D exhibited better contact properties, with a 0.02 V turn-on voltage (Von), 3.5 x 107 ON/OFF ratio, and 5.7 k & omega; contact resistance (RSD). By contrast, the device with Ti/Al/Ti S/D exhibited degraded characteristics, with a -0.3 V Von, 0.9 x 107 ON/OFF ratio, and 17 k & omega; RSD owing to metal oxidation. The contact properties were further examined through ultraviolet photoelectron spectroscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy. Vertical TFTs were fabricated using Mo/Al/Mo and Ti/Al/Ti electrodes, and their electrical properties were investigated. The vertical TFT with Mo/Al/Mo electrodes exhibited reasonable performance, with a field-effect mobility of 3.3 cm2 V-1 s-1 and RSD of 15 k & omega;. Conversely, the device with Ti/Al/Ti electrodes yielded degraded transfer characteristics, with a mobility of 0.05 cm2 V-1 s-1 and RSD of 984 k & omega;. The analysis indicates that electrode materials significantly influence the electrical performance of vertical TFTs. Therefore, electrode materials must be carefully selected and structured to realize high-end vertical TFT arrays. Vertical thin-film transistors (TFTs) with low contact resistance are necessary to realize high-resolution displays for virtual reality and augmented reality applications.-
dc.languageEnglish-
dc.publisherROYAL SOC CHEMISTRY-
dc.titleContact properties of a low-resistance aluminum-based electrode with metal capping layers in vertical oxide thin-film transistors-
dc.typeArticle-
dc.identifier.wosid001086194300001-
dc.identifier.scopusid2-s2.0-85174488799-
dc.type.rimsART-
dc.citation.volume11-
dc.citation.issue41-
dc.citation.beginningpage14177-
dc.citation.endingpage14186-
dc.citation.publicationnameJOURNAL OF MATERIALS CHEMISTRY C-
dc.identifier.doi10.1039/d3tc02880-
dc.contributor.localauthorPark, Sang-Hee Ko-
dc.contributor.nonIdAuthorJeon, Sori-
dc.contributor.nonIdAuthorHwang, Chi-Sun-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusGA-ZN-O-
dc.subject.keywordPlusHIGH-MOBILITY-
dc.subject.keywordPlusHYDROGEN-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusOXYGEN-
dc.subject.keywordPlusTFTS-
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