DC Field | Value | Language |
---|---|---|
dc.contributor.author | Sasikala, Suchithra Padmajan | ko |
dc.contributor.author | Huang, Kai | ko |
dc.contributor.author | Giroire, Baptiste | ko |
dc.contributor.author | Prabhakaran, Prem | ko |
dc.contributor.author | Henry, Lucile | ko |
dc.contributor.author | Penicaud, Alain | ko |
dc.contributor.author | Poulin, Philippe | ko |
dc.contributor.author | Aymonier, Cyril | ko |
dc.date.accessioned | 2022-12-26T08:00:20Z | - |
dc.date.available | 2022-12-26T08:00:20Z | - |
dc.date.created | 2022-12-26 | - |
dc.date.issued | 2016-11 | - |
dc.identifier.citation | ACS APPLIED MATERIALS & INTERFACES, v.8, no.45, pp.30964 - 30971 | - |
dc.identifier.issn | 1944-8244 | - |
dc.identifier.uri | http://hdl.handle.net/10203/303710 | - |
dc.description.abstract | We report the exfoliation of graphite and simultaneous N doping of graphene by two methods: supercritical ammonia treatment and liquid-phase exfoliation with NH4OH. While the supercritical ammonia allowed N doping at a level of 6.4 atom % in 2 h, the liquid-phase exfoliation with NH4OH allowed N doping at a level of 2.7 atom % in 6 h. The N doped graphene obtained via the supercritical ammonia route had few layers (<5) and showed large lateral flake size (similar to 8 mu m) and low defect density (I-D/I-G < 0.6) in spite of their high level of N doping. This work is the first demonstration of supercritical ammonia as an exfoliation agent and N doping precursor for graphene. Notably, the N doped graphene showed electrocatalytic activity toward oxygen reduction reaction with high durability and good methanol tolerance compared to those of commercial Pt/C catalyst. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.title | Simultaneous Graphite Exfoliation and N Doping in Supercritical Ammonia | - |
dc.type | Article | - |
dc.identifier.wosid | 000388429600035 | - |
dc.identifier.scopusid | 2-s2.0-84996482995 | - |
dc.type.rims | ART | - |
dc.citation.volume | 8 | - |
dc.citation.issue | 45 | - |
dc.citation.beginningpage | 30964 | - |
dc.citation.endingpage | 30971 | - |
dc.citation.publicationname | ACS APPLIED MATERIALS & INTERFACES | - |
dc.identifier.doi | 10.1021/acsami.6b10570 | - |
dc.contributor.nonIdAuthor | Huang, Kai | - |
dc.contributor.nonIdAuthor | Giroire, Baptiste | - |
dc.contributor.nonIdAuthor | Prabhakaran, Prem | - |
dc.contributor.nonIdAuthor | Henry, Lucile | - |
dc.contributor.nonIdAuthor | Penicaud, Alain | - |
dc.contributor.nonIdAuthor | Poulin, Philippe | - |
dc.contributor.nonIdAuthor | Aymonier, Cyril | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | supercritical ammoniain situ N doping of grapheneliquid-phase exfoliationelectrochemical catalystoxygen reduction reaction | - |
dc.subject.keywordPlus | NITROGEN-DOPED GRAPHENEFEW-LAYER GRAPHENEOXYGEN REDUCTION ELECTROCATALYSTCHEMICAL-VAPOR-DEPOSITIONELECTRICAL-PROPERTIESRECENT PROGRESSHIGH-YIELDOXIDENANOSHEETSLIQUID | - |
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